Atomic Layer Deposition of Al2O3/TiO2 Multilayer Films on Silk for High-Efficiency UV Shielding Properties (2025)

    Surfaces, Interfaces, and Applications

    • Tonghe Xing

      Tonghe Xing

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

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    • Annan He

      Annan He

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

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    • Zhiming Du

      Zhiming Du

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Zhiming Du

    • Yu Zhang

      Yu Zhang

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Yu Zhang

    • Yuxin Luo

      Yuxin Luo

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Yuxin Luo

    • Zhiyu Huang

      Zhiyu Huang

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Zhiyu Huang

    • Mengqi Wang

      Mengqi Wang

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Mengqi Wang

    • Zhicheng Shi

      Zhicheng Shi

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

    • Aixin Tong

      Aixin Tong

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Aixin Tong

    • Sijie Qiao

      Sijie Qiao

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Sijie Qiao

    • Xiaohong Liao

      Xiaohong Liao

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

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    • Jie Bai

      Jie Bai

      China Textile Engineering Society, Beijing 100025, P.R. China

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    • Heng Pan

      Heng Pan

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Heng Pan

    • Zihui Liang

      Zihui Liang

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      More by Zihui Liang

    • Wei Ke*

      Wei Ke

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      *Email: [emailprotected]

      More by Wei Ke

    • Hao Yu*

      Hao Yu

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      *Email: [emailprotected]

      More by Hao Yu

    • Fengxiang Chen*

      Fengxiang Chen

      State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Hubei Key Laboratory of Digital Textile Equipment, and College of Textile Science and Engineering, Wuhan Textile University, Wuhan 430200, P.R. China

      *Email: [emailprotected]

      More by Fengxiang Chen

    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX

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    https://pubs.acs.org/doi/10.1021/acsami.5c00620

    Published April 18, 2025

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    Atomic Layer Deposition of Al2O3/TiO2 Multilayer Films on Silk for High-Efficiency UV Shielding Properties (4)

    Silk fiber, as a luxurious textile raw material, is widely used in the textile industry due to its excellent mechanical properties and wearing comfort. However, the poor (ultraviolet, UV) light stability of silk affects its further application in high-end textiles, fashionable apparel, and smart materials. Although surface modification can endow the excellent UV resistance of silk fibers, it often reduces its comfort property. Herein, a laminated ultrathin Al2O3/TiO2 coating with a total thickness of 120 nm is fabricated on the surface of silk fiber via a modified atomic layer deposition (ALD) technique. The tenacity of ALD-coated silk can maintain 61.1% of its original value after exposure to intense UV light (640 mW/cm2) under high temperature (>200 °C) for 6 h, which is far superior to other work that has been reported. This can be attributed to the synergistic effect of the reflection of UV light by the multilayer film barrier, the strong oxidizing free radicals by the Al2O3 layer in the innermost layer, and thermal shield of laminated ultrathin Al2O3/TiO2 film. ALD-coated silk fabrics can also demonstrate a multicycle laundering durability, thermal and chemical stabilities, and flame retardancy. More importantly, the wearing comfort of the modified silk has no obvious change. This method provides principle and technical guidance in high-performance and multifunctional fibers and devices.

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    © 2025 American Chemical Society

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    • Atomic layer deposition
    • Biomimetic materials
    • Fibers
    • Layers
    • Oxides

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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX

    Click to copy citationCitation copied!

    Published April 18, 2025

    Publication History

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    • Revised

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      online

    © 2025 American Chemical Society

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